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Please use this identifier to cite or link to this item: http://dspace.bsuedu.ru/handle/123456789/65383
Title: On anomalous diffusion of fast electrons through the silicon crystal
Authors: Syshchenko, V.V.
Tarnovsky, A.I.
Dronik, V.I.
Keywords: physics
solid state physics
channeling
silicon
numerical simulation
anomalous diffusion
fast electrons
Issue Date: 2024
Citation: Syshchenko V.V. On anomalous diffusion of fast electrons through the silicon crystal / V.V. Syshchenko, A.I. Tarnovsky, V.I. Dronik // Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques. - 2024. - Vol.18, №5.-P. 1094-1099. - Doi: 10.1134/S1027451024700873. - Refer.: p. 1098-1099.
Abstract: In this work, the anomalous diffusion exponent has been found by numerical simulation for different values of the energy of electron transverse motion in the (100) plane of a silicon crystal
URI: http://dspace.bsuedu.ru/handle/123456789/65383
Appears in Collections:Статьи из периодических изданий и сборников (на иностранных языках) = Articles from periodicals and collections (in foreign languages)

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