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Please use this identifier to cite or link to this item: http://dspace.bsu.edu.ru/handle/123456789/28225
Title: RF-Magnetron sputtering of silicon carbide and silicon nitride films for solar cells
Authors: Zakhvalinskii, V. S.
Piljuk, E. A.
Goncharov, I. Yu.
Rodriges, V. G.
Taran, S. V.
Keywords: physics
solid state physics
thin films
RF magnetron sputtering
solar cells
silicon carbide
silicon nitride
atomic force microscopy
Issue Date: 2014
Citation: RF-Magnetron sputtering of silicon carbide and silicon nitride films for solar cells / V.S. Zakhvalinskii [и др.] // Journal of Nano- and Electronic Physics. - 2014. - Vol.6, №3.-Art. 03062.
Abstract: RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type
URI: http://dspace.bsu.edu.ru/handle/123456789/28225
Appears in Collections:Статьи из периодических изданий и сборников (на иностранных языках) = Articles from periodicals and collections (in foreign languages)

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